{"id":1916,"date":"2017-10-13T22:44:54","date_gmt":"2017-10-13T20:44:54","guid":{"rendered":"https:\/\/www.adimec.com\/high-resolution-cameras-combined-with-high-speeds-support-latest-smartphones-production-demand\/"},"modified":"2018-07-30T11:45:46","modified_gmt":"2018-07-30T09:45:46","slug":"high-resolution-cameras-combined-with-high-speeds-support-latest-smartphones-production-demand","status":"publish","type":"post","link":"https:\/\/www.adimec.com\/ja\/high-resolution-cameras-combined-with-high-speeds-support-latest-smartphones-production-demand\/","title":{"rendered":"High-resolution cameras combined with high speeds support latest smartphones production demand"},"content":{"rendered":"
Higher resolution cameras combined with high speeds allow for improvements in accuracy required by manufacturers of semiconductor wafer inspection and metrology equipment.<\/b><\/p>\n
<\/p>\n
While companies like Samsung and Apple are responding to and feeding the consumers’ demands for more and better smartphones and tablets, the semiconductor manufacturing industry has grown by focusing on supporting them<\/a>. <\/p>\n To increase the capabilities of smartphones, more powerful processors are required with higher density chips.<\/p>\n This presents new challenges for manufactures of inspection and metrology equipment. With semiconductor wafer manufacturing<\/a>, smaller features must be detected without compromises in throughput to help sustain or improve yield.<\/p>\n Detect Smaller Features<\/b><\/p>\n The push into the 22 and 20 nm technology node<\/a> results in many changes. There has been an on-going evolution in front-end semiconductor manufacturing to move from in-line inspection rather than off-line, destructive analysis whenever possible. This requires a variety of inspection and metrology equipment with high quality and stable visible, Infra Red (IR), or Ultra Violet (UV) sensitive cameras. <\/p>\n Bare Wafer Metrology<\/span><\/p>\n Before any transistor is laid down, the incoming silicon wafer must be analyzed for flatness and defects. From this inspection, wafers can be classified to allow the best wafers to be used for the smallest technology node. Typically measurement techniques such as interferometry are used for this. Extremely stable cameras with low noise are needed for accurate measurements. More on this later…<\/p>\n Overlay Metrology<\/span><\/p>\n As the features become smaller, the need to align the layers precisely is greater. There are different techniques used for this, but all require a high quality camera. As with all measurements, high quality means that the variations in the camera and the images are smaller than the variations of what you are trying to measure in the production line so you are not measuring within the noise of the camera.<\/p>\n Micro Defect Inspection<\/span><\/p>\n The defects and particles that are disruptive are even smaller with the smaller features and devices. Higher resolution cameras with better spatial resolution can improve capabilities for these inspection systems. <\/p>\n CD Metrology<\/span><\/p>\n With the latest technology nodes, there are even tighter dimensions to measure accurately. Again the implementation of higher resolution cameras can improve capabilities.<\/p>\n <\/p>\n Increase wafer throughput <\/b><\/p>\n For all of the techniques mentioned above, precision and accuracy must be increased while maintaining or increasing throughput.<\/p>\n The challenge for camera manufacturers is to preserve image quality at the fastest frame speeds, but it is possible. Supporting camera technology\/functionality such as burst mode<\/a>, CoaXPress<\/a> and region of interest (ROI)<\/a> can further increase speeds.<\/p>\n <\/p>\n Improve yield with reliable & stable performance<\/b><\/p>\n